Defect Migration and Recombination in Nanoindentation of Silica Glass

Published
Publication AIP - Applied Physics Letters
Authors
Nomura, K., Chen, Y., Kalia, R.K., Nakano, A., Vashishta, P.
Publication Date
Name of Publication Source
AIP - Applied Physics Letters
Publisher
American Institute of Physics
Volume
99
Issue
111906
Page Numbers
doi:10.1063/1.3637052
Source Link
http://apl.aip.org/resource/1/applab/v99/i11/p111906_s1